01:40 PM EST, 01/14/2025 (MT Newswires) -- Lam Research ( LRCX ) said Tuesday its dry photoresist technology qualified for advanced patterning of semiconductor devices.

Imec, a research and development hub focused on nano electronics and digital technologies, approved Lam's technology for direct-print 28nm pitch back end of line logic at 2nm and below, the company said.

Lam said the technology "enhances the resolution, productivity and yield of extreme ultraviolet lithograph" used in manufacturing next-generation semiconductor devices.

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