08:01 AM EDT, 10/22/2024 (MT Newswires) -- HPQ Silicon ( HPQFF ) said Tuesday it has filed a provisional patent application in France, expanding its pending patent for the continuous SiOx manufacturing process. The patent outlines the technologies and processes required for the production of high-performance silicon-based materials.

"This new patent application, along with the validated potential of our material, further strengthens our unique value proposition in the silicon-based anode materials market," said President and CEO Bernard Tourillon.

HPQ is assembling a patent portfolio focused on technological building blocks necessary for vertically integrated, low-carbon, low-cost, and high-throughput high-performance silicon-based anode materials manufacturing processes.